Atomic Layer Deposition and Etching Experimental Schema Evolution

[SameerSamji]

This issue tracks the changes made across different versions of the ALD and ALE experimental process schemas, extracted using the Schema-Miner tool.

Version 1 (Initial Release)

• Schema derived from scientific publications using Schema-Miner and expert feedback.
• Each schema captures essential process properties, along with their respective constraints, data types, and other structural details necessary for standardized representation and interoperability.
• Included standard process parameters and material characterization fields.

The extracted schemas have also been uploaded as templates to the Open Research Knowledge Graph (ORKG), and can be accessed via the following links:

ALD Experimental Schema: https://orkg.org/templates/R796110
ALE Experimental Schema: https://orkg.org/templates/R1379555

The JSON schema for this version is available at the following Zenodo record,
Zenodo Link: https://doi.org/10.5281/zenodo.16413857

Version 2 (Semantic enrichment using the QUDT Ontology)

• Introduced three new fields for all properties that represent physical quantities:
  • quantityKind: Specifies the type of physical quantity (e.g., Temperature, Pressure).
  • unit: Defines the measurement unit for the quantity (e.g., Kelvin, Pascal).
  • quantityValue: Holds the numeric value corresponding to the property.
• This addition improves semantic clarity, interoperability, and data validation.

All mapped properties, their quantityKind, and unit values are listed in the attached file: qudt-mapped-properties-overview.pdf

The extracted schemas have also been uploaded as templates to the Open Research Knowledge Graph (ORKG), and can be accessed via the following links:

ALD Experimental Schema: https://orkg.org/templates/R1366244
ALE Experimental Schema: https://orkg.org/templates/R1379646

Zenodo Link: https://doi.org/10.5281/zenodo.16603412

Version 3 (Super cycle based ALD Schema)

This version enhances the ALD Experimental schema with broader support for complex materials and supercycle process modeling.

• Extended to model binary, ternary, and quaternary materials.
• Enables modeling of advanced supercycle-based processes (e.g., IGZO).
• Now includes per-compound growth values, number of cycles, and resulting film thickness.
• Flow rates of individual precursors and co-reactants added as process parameters.
• Each material property now includes an associated measurement method.
• New deviceProperties section added for Thin-Film Transistor (TFT) evaluation: fieldEffectMobility, thresholdVoltage, subthresholdSwing and onOffRatio

All mapped properties, their quantityKind, and unit values are listed in the attached file: qudt-mapped-properties-overview.pdf

The extracted schemas have also been uploaded as templates to the Open Research Knowledge Graph (ORKG), and can be accessed via the following links:

ALD Experimental Schema: https://orkg.org/templates/R1434174

Zenodo Link: https://doi.org/10.5281/zenodo.16708258